Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding
CC BY
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Springer
2023
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| Truy cập trực tuyến: | https://link.springer.com/article/10.1007/s40820-023-01061-1 https://dlib.phenikaa-uni.edu.vn/handle/PNK/8057 |
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oai:localhost:PNK-80572023-04-19T03:26:23Z Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding Fukang, Deng Jianhong, Wei Yadong, Xu transition metal dichalcogenides TMD-based materials CC BY Low-dimensional transition metal dichalcogenides (TMDs) have unique electronic structure, vibration modes, and physicochemical properties, making them suitable for fundamental studies and cutting-edge applications such as silicon electronics, optoelectronics, and bioelectronics. However, the brittleness, low toughness, and poor mechanical and electrical stabilities of TMD-based films limit their application. Herein, a TaS2 freestanding film with ultralow void ratio of 6.01% is restacked under the effect of bond-free van der Waals (vdW) interactions within the staggered 2H-TaS2 nanosheets. The restacked films demonstrated an exceptionally high electrical conductivity of 2,666 S cm−1, electromagnetic interference shielding effectiveness (EMI SE) of 41.8 dB, and absolute EMI SE (SSE/t) of 27,859 dB cm2 g−1, which is the highest value reported for TMD-based materials. 2023-04-19T03:26:23Z 2023-04-19T03:26:23Z 2023 Book https://link.springer.com/article/10.1007/s40820-023-01061-1 https://dlib.phenikaa-uni.edu.vn/handle/PNK/8057 en application/pdf Springer |
| institution |
Digital Phenikaa |
| collection |
Digital Phenikaa |
| language |
English |
| topic |
transition metal dichalcogenides TMD-based materials |
| spellingShingle |
transition metal dichalcogenides TMD-based materials Fukang, Deng Jianhong, Wei Yadong, Xu Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding |
| description |
CC BY |
| format |
Book |
| author |
Fukang, Deng Jianhong, Wei Yadong, Xu |
| author_facet |
Fukang, Deng Jianhong, Wei Yadong, Xu |
| author_sort |
Fukang, Deng |
| title |
Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding |
| title_short |
Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding |
| title_full |
Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding |
| title_fullStr |
Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding |
| title_full_unstemmed |
Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding |
| title_sort |
regulating the electrical and mechanical properties of tas2 films via van der waals and electrostatic interaction for high performance electromagnetic interference shielding |
| publisher |
Springer |
| publishDate |
2023 |
| url |
https://link.springer.com/article/10.1007/s40820-023-01061-1 https://dlib.phenikaa-uni.edu.vn/handle/PNK/8057 |
| _version_ |
1763633854624563200 |
| score |
8.8926115 |