Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding

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Main Authors: Fukang, Deng, Jianhong, Wei, Yadong, Xu
Format: Book
Language:English
Published: Springer 2023
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Online Access:https://link.springer.com/article/10.1007/s40820-023-01061-1
https://dlib.phenikaa-uni.edu.vn/handle/PNK/8057
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spelling oai:localhost:PNK-80572023-04-19T03:26:23Z Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding Fukang, Deng Jianhong, Wei Yadong, Xu transition metal dichalcogenides TMD-based materials CC BY Low-dimensional transition metal dichalcogenides (TMDs) have unique electronic structure, vibration modes, and physicochemical properties, making them suitable for fundamental studies and cutting-edge applications such as silicon electronics, optoelectronics, and bioelectronics. However, the brittleness, low toughness, and poor mechanical and electrical stabilities of TMD-based films limit their application. Herein, a TaS2 freestanding film with ultralow void ratio of 6.01% is restacked under the effect of bond-free van der Waals (vdW) interactions within the staggered 2H-TaS2 nanosheets. The restacked films demonstrated an exceptionally high electrical conductivity of 2,666 S cm−1, electromagnetic interference shielding effectiveness (EMI SE) of 41.8 dB, and absolute EMI SE (SSE/t) of 27,859 dB cm2 g−1, which is the highest value reported for TMD-based materials. 2023-04-19T03:26:23Z 2023-04-19T03:26:23Z 2023 Book https://link.springer.com/article/10.1007/s40820-023-01061-1 https://dlib.phenikaa-uni.edu.vn/handle/PNK/8057 en application/pdf Springer
institution Digital Phenikaa
collection Digital Phenikaa
language English
topic transition metal dichalcogenides
TMD-based materials
spellingShingle transition metal dichalcogenides
TMD-based materials
Fukang, Deng
Jianhong, Wei
Yadong, Xu
Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding
description CC BY
format Book
author Fukang, Deng
Jianhong, Wei
Yadong, Xu
author_facet Fukang, Deng
Jianhong, Wei
Yadong, Xu
author_sort Fukang, Deng
title Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding
title_short Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding
title_full Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding
title_fullStr Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding
title_full_unstemmed Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding
title_sort regulating the electrical and mechanical properties of tas2 films via van der waals and electrostatic interaction for high performance electromagnetic interference shielding
publisher Springer
publishDate 2023
url https://link.springer.com/article/10.1007/s40820-023-01061-1
https://dlib.phenikaa-uni.edu.vn/handle/PNK/8057
_version_ 1763633854624563200
score 8.881002